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NIH3D

Contact Shadow Mask - Negative

Created by
lwilder
Created:
10/30/14
Submitted:
10/5/26
Published:
10/5/26

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Learn more about NIH 3D workflow outputs

3DPX-000747

Licensing:

CC-BY-SA
224
16
Version 3

Category

Hardware & Devices
Devices and Hardware
Description

This is a contact shadow mask for use with a negative photo-resist (PR) during UV-lithography. It is used in micro-fabrication and its customize-able to get different feature shapes and sizes.